The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 11, 2000
Filed:
Oct. 27, 1997
Steven J Yang, Hsinchu Hsien, TW;
Jane Huei-Chen Chang, Hsinchu Hsien, TW;
Chung-Tao Chang, Hsinchu Hsien, TW;
Hsiu-Tsang Lee, Hsinchu Hsien, TW;
Industrial Technology Research Institute, Hsinchu, TW;
Abstract
Automatic alignment methods for a membrane prober are disclosed. Alignment patterns are designed and manufactured on both a membrane prober and a wafer under test. The patterns are properly designed for acquiring a first set of measurement data that provide relative position information when the prober contacts the wafer. A second set of measurement data can be obtained by a controlled move between the prober and the wafer. The relative position including the translation offset and the rotation angle can be computed by the information derived from the two sets of measurement data. The second set of measurement data may also be acquired by having two alignment pattern pairs that are made to contact in a single touch. More accurate alignment can be achieved by using more pairs of alignment patterns.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile