The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 11, 2000
Filed:
Apr. 06, 1999
Yaw S Obeng, Orlando, FL (US);
Laurence D Schultz, Kissimmee, FL (US);
Lucent Technologies Inc., Murray Hill, NJ (US);
Abstract
The present invention provides a continuous slurry delivery system for use with a polishing apparatus employing a slurry. The continuous slurry delivery system comprises a mixing chamber, slurry component tanks, a chemical parameter sensor system, and a control system. Each of the slurry component tanks contains a different slurry component and is in fluid connection with the mixing chamber to deliver a required rate of the different slurry component to the mixing chamber. The chemical parameter sensor system is coupled to the mixing chamber and configured to sense a chemical property of the slurry. The control system is coupled to the chemical parameter sensor system and is configured to introduce at least one of the slurry components at a given rate to the mixing chamber.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile