The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 21, 2000
Filed:
Mar. 17, 1998
Applicant:
Inventors:
Yoshihiko Toyoda, Hyogo, JP;
Tetsuo Fukada, Hyogo, JP;
Takeshi Mori, Hyogo, JP;
Makiko Hasegawa, Hyogo, JP;
Assignee:
Mitsubishi Denki Kabushiki Kaisha, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C / ; C23C / ;
U.S. Cl.
CPC ...
118715 ; 118726 ;
Abstract
In a CVD apparatus for Cu formation using as a raw material, a mixture of a solvent and a liquid raw material including Cu(HFA) and adducted molecules or a solid raw material including Cu(HFA) and adducted molecules, a fluorinated organic polymer contained, a fluorinated metal, an insulator or a Ti compound is provided on a surface of a member at a portion where the raw material exists.
Toyoda, Yoshihiko. (2000). Cvd apparatus for cu formation (U.S. Patent No. 6039808). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6039808
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile