The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 14, 2000
Filed:
Dec. 18, 1996
Applicant:
Inventors:
Paul C Allen, Beaverton, OR (US);
Eugene Mirro, Portland, OR (US);
Assignee:
Etec Systems, Inc., Hayward, CA (US);
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B41J / ;
U.S. Cl.
CPC ...
347255 ; 347256 ; 347260 ; 347261 ; 347239 ;
Abstract
A laser pattern generator for semiconductor mask making or direct writing of features on a semiconductor wafer uses a pulsed laser source to achieve high power and short wavelength (e.g. 263 nm or less) radiation, for writing very small-sized features. The laser pulse frequency is either synchronous or asynchronous to the writing grid of the features being written, in various embodiments.