The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 22, 2000
Filed:
Sep. 30, 1997
David H Tracy, Norwalk, CT (US);
Alan M Ganz, Trumbull, CT (US);
Yongdong Wang, Wilton, CT (US);
David A Huppler, Madison, WI (US);
Juan C Ivaldi, Foster City, CA (US);
Christopher B Hanna, Somerville, MA (US);
Perkin Elmer LLC, Norwalk, CT (US);
Abstract
A spectrometric instrument includes a detector with detecting subarrays on small portions of the surface. Spectral data are acquired for selected subarrays at a first time for a drift standard, and compared to a zero position to obtain first offset data. Data are acquired similarly at a second time to obtain second offset data. The offset data are utilized to obtain a spectral shift for any subarray position at any selected time. The shift is applied to a matrix model used for converting test data to compositional information. Archive data for the model is obtained in the foregoing manner, using slit scanning in the instrument to achieve sub-increments smaller than the detector pixel size, with a procedure to assure that there is an integral number of scanning steps across one pixel. The drift standard may be chemical analytes, or an optical interference element producing fringes related to spectral positions in each subarray. A procedure is used to identify the fringe peaks to spectral position, with temperature correction.