The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 22, 2000
Filed:
Dec. 15, 1997
Mitsubishi Denki Kabushiki Kaisha, Tokyo, JP;
Ryoden Semiconductor System Engineering Corporation, Hyogo, JP;
Abstract
A method of manufacturing a semiconductor device can suppress an etching damage to a bipolar transistor part and a CMOS transistor part while simplifying a manufacturing process. According to this manufacturing method, an external base leader electrode layer which will form an external base leader electrode is used as an etching protection film for forming a CMOS transistor, and a layered film including a polycrystalline silicon film which will ultimately form a gate electrode is used as an etching protection film during formation of a bipolar transistor. Thereby, a step of forming the etching protection film can be utilized also as a step of forming the external base electrode and the gate electrode. Consequently, the etching damages to the bipolar transistor part and the CMOS transistor part are suppressed while simplifying the manufacturing process.