The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 22, 2000
Filed:
Oct. 24, 1997
Yoshiki Aruga, Tokyo, JP;
Yo Kamikura, Tokyo, JP;
Anelva Corporation, Fuchu, JP;
Abstract
An in-line film deposition system is adapted so that film deposition processing on a substrate is completed through a number of film deposition processes, while the length of the system is not excessive. A carrier 3 which holds two substrates 1, with their planar surfaces set parallel to a transfer direction, is sequentially transferred through a plurality of vacuum chambers 2 arranged along a polygonally-shaped transfer path 30. Film deposition processing is continuously carried out on the substrate 1 by processing means 4 that are arranged in the vacuum chambers 2 which form film deposition process chambers. A rotation mechanism for rotating the carrier 3 through a specified angle so as to direct the carrier 3 in a subsequent transferring direction is provided in those vacuum chambers which are located at turning points along the polygonal transfer path 30.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile