The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 22, 2000
Filed:
May. 06, 1998
Joung-hyun Lim, Yongin, KR;
Hee-Sun Chae, Yongin, KR;
Samsung Electronics Co., Ltd., Suwon, KR;
Abstract
A dry etching apparatus is capable of suppressing formation of reaction products (i.e., polymers) in an etching chamber. A gas supply is connected to the top of the etching chamber by a first gas duct, and a pump is connected to the bottom of the etching chamber by a second gas duct. An upper electrode is furnished in the etching chamber. At a location opposed to the upper electrode, a lower electrode is furnished. Insulation plates of the upper and the lower electrodes, or an insulation plate of either of the upper or the lower electrode, include a plurality of grooves. The etching chamber may include a plurality of grooves and projections on its sidewalls. The plurality of projections in the sidewalls has a semicircular or a rectangular cross-section, and may be formed as a single body or as individually detachable projection bodies. Accordingly, it is possible to improve the conductance and exhaustion velocity in the etching chamber using the plurality of grooves in the insulation plates of the electrodes and the grooves in the sidewalls of the chamber. As a result, the formation of polymers that may act as particles during an etching process can be suppressed. Additionally, the accumulated polymers can be more widely dispersed.