The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 15, 2000
Filed:
Aug. 20, 1997
Applicant:
Inventors:
Yuan-Ko Hwang, Hualien, TW;
Ying-Chen Chao, Hsinchu, TW;
Assignee:
Vanguard International Semiconductor Corporation, Hsinchu, TW;
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G06F / ; H01L / ;
U.S. Cl.
CPC ...
1566271 ; 156345 ; 395 23 ; 315134 ;
Abstract
A method and apparatus for monitoring condition of the plasma of a plasma process during processing is disclosed. A spectrum detector (12) detects the intensity of a predetermined wavelength of radiation produced by the plasma process. The output of the spectrum detector is sampled, filtered, and normalized. A parameter calculator (20) calculates a parameter such as velocity or acceleration of the intensity. The calculated parameter is compared to a predetermined threshold. If the parameter exceeds the predetermined threshold, an error condition is indicated.