The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 07, 1999
Filed:
Dec. 12, 1997
Applicant:
Inventors:
Tsutomu Shoki, Hachioji, JP;
Takamitsu Kawahara, Kawasaki, JP;
Assignee:
Hoya Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F / ;
U.S. Cl.
CPC ...
378 35 ; 378 34 ; 430-5 ;
Abstract
An X-ray mask blank and a manufacturing method for an X-ray mask make it possible to manufacture an X-ray mask which has an extremely low stress, thus providing an extremely high positional accuracy. In the X-ray mask blank, an X-ray transparent film is formed on a substrate, and an X-ray absorber film is formed on the X-ray transparent film. An etching mask layer composed of a material containing chromium and carbon, and/or nitrogen is provided on the X-ray absorber film.