The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 07, 1999

Filed:

Apr. 16, 1997
Applicant:
Inventors:

Mukul Saran, Richardson, TX (US);

James F Garvin, Jr, Carrollton, TX (US);

Wei-Yung Hsu, Dallas, TX (US);

Assignee:
Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L / ;
U.S. Cl.
CPC ...
438685 ; 438629 ; 438625 ; 438648 ; 438688 ; 438637 ;
Abstract

A method of filling openings (20, 50) in a semiconductor (10, 40) includes the steps of first forming a fill metal layer (30, 60) over the semiconductor which substantially covers the openings (20, 50). Thereafter, a surface coating (32, 62, 64) of a predetermined material is formed over the fill metal layer (30, 60). Then, high pressure is applied on the surface coating (32, 62, 64) to force the fill metal into the openings (20, 50). Metal film surface cracks previously plaguing force-fill processes are thereby eliminated or substantially reduced.


Find Patent Forward Citations

Quick Actions:

Saran, Mukul. (1999). Method of forming contacts and vias in semiconductor (U.S. Patent No. 5998296). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5998296

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Loading…