The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 07, 1999
Filed:
Apr. 06, 1998
Ai-Qiang Zhang, Singapore, SG;
Chartered Semiconductor Manufacturing, Ltd., Singapore, SG;
Abstract
A method for forming a hydrophobic material layer upon a hydrophilic material layer over a substrate. There is first provided a substrate. There is then formed over the substrate a hydrated hydrophilic material layer. There is then treated the hydrated hydrophilic material layer with a glycol ether acetate material in the absence of an organofunctional silane material to form a glycol ether derivatized hydrophilic material layer having a glycol ether moiety covalently bonded thereto through condensation of the hydrated hydrophilic material layer with the glycol ether acetate material. Finally, there is then formed upon the glycol ether derivatized hydrophilic material layer a hydrophobic material layer. The method is particularly useful in enhancing adhesion onto hydrated hydrophilic material layers of positive photoresist material layers whose solubility in a developer results from a photogenerated acid material.