The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 07, 1999
Filed:
Jun. 03, 1997
Applicant:
Inventors:
Tsutomu Higo, Kanagawa-ken, JP;
Roberto Masahiro Serikawa, Kanagawa-ken, JP;
Kazuhiro Kondo, Tokyo, JP;
Assignee:
Ebara Corporation, , JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C02F / ;
U.S. Cl.
CPC ...
210758 ; 210759 ; 210760 ; 210761 ; 210767 ; 210908 ; 422188 ;
Abstract
A hydrothermal reaction is performed on an aqueous medium without adding an oxidizing agent, and then another hydrothermal reaction is performed in the presence of an oxidizing agent, thereby reducing a chemical oxygen demand of the aqueous medium. An apparatus for performing a hydrothermal reaction has a fluid inlet being capable of introducing an oxidizing agent in a fluid form during a hydrothermal reaction.