The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 07, 1999
Filed:
Nov. 26, 1996
Tokyo Electron Limited, Tokyo, JP;
Abstract
A process and apparatus for setting a working rate distribution along a work surface which is being AC plasma-enhanced reactively coated, or reactively or non-reactively etched in an AC plasma, and in which process a plasma volume of given volume is utilized, comprises placing the work surface in the plasma volume, positioning a setting surface of a distribution setting body opposite the work surface, the setting body being surrounded by the plasma volume substantially on all sides of the setting body, and setting the working rate distribution by selecting either the material of the setting surface, the quality of the setting surface, a distance relationship between the setting surface and the work surface, or the shape of the setting surface.