The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 07, 1999
Filed:
Oct. 06, 1997
Applicant:
Inventor:
Miyako Yamasaka, Yamanashi-ken, JP;
Assignee:
Tokyo Electron Limited, Tokyo, JP;
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B08B / ;
U.S. Cl.
CPC ...
134-2 ; 134-3 ; 134 26 ; 134 28 ; 134 30 ; 134 33 ; 134 41 ; 134 952 ; 134 953 ; 1341021 ; 134153 ; 134902 ;
Abstract
A method for washing and drying a substrate includes the steps of (a) disposing a substrate on a spin chuck such that a surface to be treated faces upward, (b) applying a washing solution from a first nozzle to the surface of the substrate while rotating the substrate disposed on the spin chuck so as to cleanse the surface, and (c) blowing a gas from a second nozzle against the surface while rotating the substrate and moving the second nozzle above the substrate in a radial direction from a central portion toward a peripheral portion of the substrate, thereby drying the surface of the substrate.