The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 23, 1999
Filed:
Apr. 06, 1998
Applicant:
Inventor:
Akihiro Nakae, Tokyo, JP;
Assignee:
Mitsubishi Denki Kabushiki Kaisha, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F / ;
U.S. Cl.
CPC ...
430-5 ;
Abstract
A photoresist mask for use in a photolithographic process for fabricating semiconductor devices. The photo mask including a transparent substrate, and at least two light blocking regions. The at least two light blocking regions are separated by a first opening and arranged at a first pitch P.sub.1 satisfying the following relationship on a main surface of the transparent substrate in a first direction: