The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 16, 1999
Filed:
Apr. 11, 1997
Applicant:
Inventors:
Kei Nara, Yokohama, JP;
Toshio Matsuura, Tokyo, JP;
Assignee:
Nikon Corporatioin, Tokyo, JP;
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G03F / ; H01L / ;
U.S. Cl.
CPC ...
430 30 ; 430396 ; 355 68 ; 355 77 ; 250205 ;
Abstract
An exposure apparatus for exposing a photomask pattern onto a photosensitive substrate via a plurality of optical systems includes a source of illumination for irradiating the photomask pattern with beams of light adapted to pass through the pattern and optical systems onto the substrate. A scanning mechanism for synchronously scanning the photomask pattern with the beams of light is included to transfer the pattern to the substrate. A plurality of illumination intensity measuring devices is provided for substantially simultaneously measuring the illumination intensities of the beams of light passing through the optical systems.