The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 16, 1999
Filed:
Jan. 22, 1998
Donald C Wheeler, Beacon, NY (US);
Jack A Mandelman, Stormville, NY (US);
Rebecca D Mih, Wappingers Falls, NY (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
A photomask and a method for using the photomask to make dimensionally controlled resist patterns are provided. A wafer having a resist coating thereon is exposed using the mask of the invention under specially controlled defocus conditions to provide the dimensionally controlled resist pattern profile. The mask which comprises multiple phase shifter means on one side of at least one of the light shielding patterns on the mask provides light passing through the mask having multiple phases on that side of the light shielding material which produces a dimensionally controlled resist pattern profile.