The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 19, 1999
Filed:
Aug. 29, 1997
Applicant:
Inventors:
Don-Hee Lee, Kyungki-do, KR;
Ki-Chang Song, Seoul, KR;
Young-Sam Jeon, Kyungki-do, KR;
Chil-Keun Park, Kyungki-do, KR;
Assignee:
LG Semicon Co., Ltd., Chungcheongbuk-Do, KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G21K / ;
U.S. Cl.
CPC ...
378 35 ; 378210 ;
Abstract
Disclosed are X-ray masks exhibiting improved stability and reliability of the X-ray masks, and methods of making these masks. The X-ray masks include a membrane, an X-ray absorber pattern on the membrane, which is formed on a top side of a substrate, or an oxide layer between the membrane and the X-ray absorber pattern.
Lee, Don-Hee. (1999). X-ray mask and its fabrication method (U.S. Patent No. 5970114). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5970114
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile