The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 19, 1999
Filed:
Nov. 08, 1996
Applicant:
Inventors:
Boris L Druz, Brooklyn, NY (US);
Alan V Hayes, Centerport, NY (US);
Victor Kanarov, Bellemore, NY (US);
Salvatore A DiStefano, Bayshore, NY (US);
Emmanuel N Lakios, Mt. Sinai, NY (US);
Assignee:
Veeco Instruments, Inc., Plainview, NY (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J / ;
U.S. Cl.
CPC ...
3133591 ; 3133621 ; 31323101 ; 31323131 ;
Abstract
A charged particle source applicable for etching, thin film deposition, or surface modification includes a conductive electrode for controlling the plasma potential and beam voltage, the electrode retaining long term conductivity during operation, such as by shielding or in situ cleaning during operation, and/or by being operated in pulse mode conditions capable of preventing charge accumulation in the source during ion extraction.