The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 12, 1999
Filed:
Jul. 28, 1997
Luke D Hinkle, Townsend, MA (US);
D Jeffrey Lischer, Acton, MA (US);
MKS Instruments, Inc., Andover, MA (US);
Abstract
A vapor delivery system for delivering a vapor-phase reactant to a chemical process reactor at a substantially constant flow rate. The vapor delivery system includes a source of a reactant material, means for converting the reactant material to a vapor and for maintaining a predetermined volume of vapor in a vapor phase, a flow controller for providing a controlled flow of the vapor-phase reactant to the process reactor, means for detecting a parameter related to the availability of the vapor-phase reactant material to the process reactor from the flow controller, and means responsive to the detection signal for controlling the supply of reactant material to the vapor converter. In one embodiment the parameter is the pressure of the vapor within the predetermined volume. In another embodiment the parameter is the fluid conductance of a control valve within the flow controller. The vapor delivery system of the present invention can operate in either a substantially continuous or a noncontinuous delivery mode.