The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 12, 1999

Filed:

Sep. 30, 1997
Applicant:
Inventors:

Hsun-Peng Lin, Nan-Chuang Village, TW;

Fu-Tein Wung, Tao-Yuan, TW;

Chih-Hsiung Lee, Hsin-Chu, TW;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B65B / ;
U.S. Cl.
CPC ...
141 90 ; 141-4 ; 141 64 ; 141 89 ; 141 91 ; 141 95 ; 1341022 ; 134170 ;
Abstract

The present invention provides an apparatus and a method for cleaning a liquid dispensing nozzle that is utilized in semiconductor process machines by providing a cleaning solvent reservoir tank capable of receiving a dispensing nozzle and then flowing a cleaning solvent through the nozzle under pressure, and then purging through the dispensing nozzle with a processing fluid to later be utilized such that any residual cleaning solvent is purged out of the dispensing nozzle to prevent the possible back-flow or syphoning of the cleaning solvent into a processing fluid supply and the dilution of such processing fluid. The present invention apparatus is further equipped with a cleaning solvent buffer tank for holding and feeding a cleaning solvent to the reservoir tank such that the pressure in the reservoir tank can be suitably controlled.


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