The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 28, 1999
Filed:
Aug. 21, 1997
Applicant:
Inventors:
Seishi Fujiwara, Sagamihara, JP;
Hiroyuki Hiraiwa, Yokohama, JP;
Kazuhiro Nakagawa, Hachioji, JP;
Shouji Yajima, Sagamihara, JP;
Norio Komine, Sagamihara, JP;
Hiroki Jinbo, Kawasaki, JP;
Assignee:
Nikon Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C03C / ; C03C / ;
U.S. Cl.
CPC ...
501 54 ; 501 37 ; 501 57 ; 501905 ;
Abstract
The invention relates to fluorine-containing silica glasses, and methods of their production. The silica glass may be used for an ultraviolet light optical system in which light in a wavelength region of 200 nm or less, such as an ArF (193 nm) excimer laser, is used. The invention also relates to a projection exposure apparatus containing fluorine-containing glass of the invention.