The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 28, 1999

Filed:

Mar. 31, 1997
Applicant:
Inventors:

Olubunmi Olufemi Adetutu, Austin, TX (US);

Dean J Denning, Del Valle, TX (US);

James D Hayden, Austin, TX (US);

Chitra K Subramanian, Austin, TX (US);

Arkalgud R Sitaram, Austin, TX (US);

Assignee:

Motorlola, Inc., Schaumburg, IL (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C / ; H01L / ;
U.S. Cl.
CPC ...
4272481 ; 4272557 ; 427314 ; 438585 ; 438592 ; 20419215 ;
Abstract

A metal-semiconductor layer (26) is formed over an insulating layer (20) such that the metal-semiconductor layer (26) is graded to have varying amounts of the semiconductor and metal throughout the layer. In one embodiment, the metal-semiconductor layer (26) has relatively higher silicon content near the layer's lower and upper surfaces. At the midpoint, the layer is close to stoichiometric tungsten silicide. In another embodiment, a metal-semiconductor-nitrogen layer is formed having nitrogen nearer the lower surface and essentially no nitrogen near the upper surface. The layer (26) can be formed using chemical vapor deposition or sputtering.


Find Patent Forward Citations

Loading…