The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 21, 1999
Filed:
Mar. 19, 1996
Applicant:
Inventors:
Yasuo Manabe, Kawasaki, JP;
Hiromi Hoshino, Kawasaki, JP;
Assignee:
Fujitsu Limited, Kawasaki, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J / ;
U.S. Cl.
CPC ...
25049222 ;
Abstract
An exposure data preparing apparatus includes a field placement editor for placing exposure patterns that correspond to design data. Placement is done for each sub-field obtained by dividing a field on an LSI to be designed, and each sub-field has a size that can be covered by deflection of a beam from an exposure apparatus. A map preparing editor prepares a plurality of maps that can be covered by a single shot of the charged particle beam, by dividing the sub-field in which the exposure pattern is placed. A CPU determines a beam dosage of the charged particle beam derived from a density of the exposure pattern in the map.