The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 14, 1999
Filed:
Oct. 29, 1997
Rashid Bashir, Santa Clara, CA (US);
National Semiconductor Corporation, Santa Clara, CA (US);
Abstract
A semiconductor integrated circuit having a lateral bipolar transistor, is fabricated in a manner compatible with sub-micron CMOS processing. A base contact structure is formed over a bipolar active area, in essentially direct contact to a portion of the upper surface of the active region, essentially concurrent to the formation of a gate electrode on a gate dielectric layer in a CMOS active area. Sidewall spacers, adjacent the base contact region, are formed and a base region formed under the base contact structure using an oblique angle implantation. Emitter region and collector contact regions are formed concurrent with CMOS source and drain regions. An optional, oblique angle collector implant can be performed where desired.