The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 14, 1999
Filed:
Sep. 12, 1997
Applicant:
Inventors:
Mingchu King, Hsin-Chu, TW;
Shih-Shiung Chen, Hsin-Chu, TW;
Assignee:
Taiwan Semiconductor Mfg. Co., Hsin-Chu, TW;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F / ;
U.S. Cl.
CPC ...
430 22 ; 430 30 ;
Abstract
The present invention discloses a method for forming a pattern for stepper focus which can be monitored by overlay measurements such that a focal plane can be advantageously and accurately determined without human reading errors that are normally observed in conventional methods. The method for forming a stepper focus pattern for determining a focus error can be carried out by using an inner box and an outer box alignment marks and determining the shift in the center point of the two boxes as the overlay error.