The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 14, 1999
Filed:
Nov. 26, 1997
Applicant:
Inventors:
Hiroshi Mabuchi, Amagasaki, JP;
Toshihiro Hayami, Nishinomiya, JP;
Hideo Ida, Oume, JP;
Tomomi Murakami, Amagasaki, JP;
Naohiko Takeda, Nishinomiya, JP;
Junya Tsuyuguchi, Nishinomiya, JP;
Katsuo Katayama, Amagasaki, JP;
Assignee:
Sumitomo Metal Industries, Ltd., Osaka, JP;
Primary Examiner:
Int. Cl.
CPC ...
B23K / ;
U.S. Cl.
CPC ...
21912143 ; 21912144 ; 2191214 ; 20429838 ; 156 / ; 1187 / ;
Mabuchi, Hiroshi. (1999). Plasma processing apparatus and plasma processing method (U.S. Patent No. 5951887). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5951887
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile