The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 14, 1999
Filed:
Feb. 13, 1997
Yukio Minami, Osaka, JP;
Nobukazu Ikeda, Osaka, JP;
Manohar L Shrestha, Osaka, JP;
Satoshi Kagatsume, Yamanashi, JP;
Fujikin Incorporated, Osaka, JP;
Tokyo Electron Limited, Tokyo, JP;
Abstract
An apparatus for mixing and feeding plural gases flowing at different mass flow rates and having different molecular weights includes a plurality of gas feed lines connected to a mixing region having an outlet for feeding a mixture of the gases to a semiconductor production apparatus. The gas feed line carrying the lowest-flow-rate gas is connected to the mixing region at a location farther from the outlet than where any other feed line is connected to the mixing region. Feed lines carrying gases other than the lowest-flow-rate gas are connected to the mixing region according to (1) the relative mass flow rates of the gases carried by the lines (2) the relative molecular weights of the gases carried by the lines or (3) the product of the respective gas flow rates and molecular weights of the gases. At least the line carrying the lowest-flow-rate gas is provided with an apparatus for increasing the velocity of the gas flowing therein prior to entry of the gas into the mixing region.