The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 07, 1999
Filed:
Jan. 20, 1998
Applicant:
Inventors:
Chih-Chiang Liu, Hsinchu, TW;
Kuo-Cheng Chuan, Hsinchu, TW;
Assignee:
United Microelectronics Corp., Hsin-Chu, TW;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F / ;
U.S. Cl.
CPC ...
430-5 ; 430 22 ;
Abstract
A mixed mode photo-mask for a stepper. Both alignment marks of 15 mm.times.15 mm and alignment marks of 20 mm.times.20 mm are tooled on the photo mask. The photo mask further comprises a reticle glass plate, a chrome border with a pattern to be transferred, and a pellicle.
Liu, Chih-Chiang. (1999). Mixed mode photomask for nikon stepper (U.S. Patent No. 5948572). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5948572
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile