The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 31, 1999
Filed:
Feb. 06, 1998
Alan H Huggins, Gilroy, CA (US);
John MacPherson, Fremont, CA (US);
Richard J Schmidley, San Jose, CA (US);
Clear Logic, Inc., Santa Clara, CA (US);
Abstract
A method is provided for making re-usable configuration masks by initially patterning a mask blank using precision mask-making tools. The mask is then covered with an opaque material, and desired configuration points for a particular ASIC are selected with a non-precision laser. After the particular configuration pattern is no longer needed, the remaining opaque material is removed. The mask can then be re-configured for a new design by covering the mask with a new layer of opaque material and selecting new configuration points. Such a mask reduces both time and costs for creating a set of mask designs because a single mask can be re-used for several different designs without the further need of precision mask-making tools.