The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 17, 1999

Filed:

Sep. 05, 1997
Applicant:
Inventor:

Suguru Tabara, Hamamatsu, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L / ;
U.S. Cl.
CPC ...
438 17 ; 438393 ; 438591 ;
Abstract

A method of measuring electron shading damage which includes the steps of: a) preparing a characteristic curve of a flat band voltage change relative to an amount of injected charges, by intentionally flowing current through a first capacitor; b) preparing a second capacitor similar to the first capacitor; c) making a sample by using the second capacitor by forming a lamination of an insulating layer having an opening over the second capacitor, a conductive antenna layer connected to the conductive layer through the opening in the insulating layer, and an insulating mask pattern on the conductive antenna layer, the insulating mask pattern including a looped opening which leaves a separated pattern on the second capacitor; d) performing a dry process of the sample to fully remove the conductive layer under the loop opening; e) measuring a flat band voltage of the second capacitor before and after the dry process and calculating a change in the flat band voltage; and f) estimating from the calculated flat band voltage change an amount of charges injected into the second capacitor during the dry process, by referring to the characteristic curve. The method can reduce manufacture costs of a sample and provide a sufficiently high precision.


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