The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 17, 1999
Filed:
Oct. 17, 1997
Applicant:
Inventors:
Jen-Shiang Leu, Ta Teh, TW;
Jeng-Shiuan Shih, Changhua Hsien, TW;
Assignee:
Taiwan Semiconductor Manufacturing Co., Ltd., Hsinchu, TW;
Primary Examiner:
Int. Cl.
CPC ...
G03F / ; H01L / ;
U.S. Cl.
CPC ...
430318 ; 430323 ; 430329 ; 430330 ; 438694 ; 438710 ;
Abstract
A method of preventing photoresist residue on metal lines is disclosed herein. A strip recipe with a preheat step has been developed for use with the Applied Materials Mxp Centura. The preheat step is performed before the strip step. The preheat step can rapidly shorten the temperature balance time between the wafer and the strip chamber and make the photoresist flow to increase photoresist surface area. Therefore, the strip photoresist rate will be improved by higher wafer temperature in the first few strip cycles.