The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 13, 1999
Filed:
Dec. 23, 1996
Applicant:
Inventors:
Steven Verhaverbeke, West Chester, PA (US);
Mark Heyns, Linden, BE;
Menso Hendriks, Soest, NL;
Rene de Blank, Heverlee, BE;
Assignee:
IMEC vzw, Louvain, BE;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C03C / ; B44C / ;
U.S. Cl.
CPC ...
438743 ;
Abstract
Method for semiconductor processing comprising etching of oxide layers, especially etching thick SiO.sub.2 layers and/or last step in the cleaning process wherein the oxide layers are etched in the gas phase with a mixture of hydrogen fluoride and one or more carboxylic acids, eventually in admixture with water.