The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 06, 1999
Filed:
Jun. 10, 1997
Eiji Hirakawa, Yasugi, JP;
Hitachi Metals, Ltd., Tokyo, JP;
Abstract
A novel metal silicide target material is provided which can effectively restrict the occurrence of fine particles. The target material has a structure comprising metal silicide and free silicon, which material has a relative density more than 100% which relative density is defined by a ratio of a true density of the target material to a theoretical density obtained by calculation, and free silicon portions in the structure of the target material which free silicon portions are provided with Vickers hardness less than 1,100 or which free silicon portions are provided with dislocation-undetectable areas each having a diameter not less than 1 .mu.m. Further, it is desirable that a rupture load evaluated by acoustic emission at which rupture load there occurs rupture in a scratching test of the surface of target material by acoustic emission is not less than 50N.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile