The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 25, 1999

Filed:

Jan. 30, 1997
Applicant:
Inventors:

Tadanori Yoshioka, Tachikawa, JP;

Mikio Naruse, Tokyo, JP;

Harumi Kihara, Tokyo, JP;

Assignee:

JEOL Ltd., Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J / ;
U.S. Cl.
CPC ...
2504922 ; 2505051 ;
Abstract

A method and apparatus for preparing a specimen adapted for electron microscopy comprises an evacuated specimen-processing chamber. A specimen having a surface to be processed is placed inside the processing chamber A beam-blocking member is placed close to the processed surface so as to block a part of an etching beam A first etching step is performed by directing the beam at the specimen via the blocking member. Then, the specimen and the blocking member are moved relative to each other. Finally, a second etching step is performed by directing the beam at the specimen via the blocking member. As a result, the specimen becomes a thin film and it can be observed with the electron microscope.


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