The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 04, 1999
Filed:
Jun. 16, 1997
Shinji Wakui, Utsunomiya, JP;
Canon Kabushiki Kaisha, Tokyo, JP;
Abstract
A scan-projection type exposure apparatus quickly suppresses disturbance in synchronization between a wafer stage and a reticle stage, and enables high-precision pattern exposure. This apparatus employs a master-slave control with a wafer-stage side as the master with a reticle-stage side as the slave, so as to correct a target value of a position control system of a rough-motion stage or that of a position control system of the reticle stage by using motion-mode errors e.sub.g, e.theta..sub.x and e.theta..sub.y in a one-to-one correspondence with a disturbance occurring to the rough-motion stage of the wafer stage due to movement of a fine-motion stage of the wafer stage.