The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 20, 1999
Filed:
Dec. 01, 1997
Applicant:
Inventors:
Tadahiro Ohmi, Aoba-ku, Sendai-shi, Miyagi-ken 980, JP;
Takahisa Nitta, Tokyo, JP;
Assignees:
Kabushiki Kaisha Ultraclean Technology Research Institute, Tokyo, JP;
Other;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B24D / ;
U.S. Cl.
CPC ...
51307 ; 51308 ; 51309 ; 252 791 ;
Abstract
An abrasive composition which can realize chemical-mechanical polishing superior in polishing speed and polishing uniformity. The abrasive composition comprises abrasive grains, isopropyl alcohol, and water. Grain sizes of the abrasive grains are preferably 30 to 250 nm, and the abrasive grains are preferably SiO.sub.2. Further, it is preferable that contents of the abrasive grains and isopropyl alcohol are 5 to 30 wt % and 1 to 15 wt %, respectively. The abrasive composition of the present invention is characterized in that it is deaerated.