The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 13, 1999
Filed:
Nov. 01, 1996
Applicant:
Inventors:
Reinhard J Stengl, Stadtbergen, DE;
Erwin Hammerl, Emmerting, DE;
Jack A Mandelman, Stormville, NY (US);
Herbert L Ho, New Windsor, NY (US);
Radhika Srinivasan, Ramsey, NJ (US);
Alvin P Short, Poughkeepsie, NY (US);
Bernhard Poschenrieder, Saint-Cloud, FR;
Assignees:
Siemens Aktiengesellschaft, Munich, DE;
International Business Machines Corporation, Armonk, NY (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L / ;
U.S. Cl.
CPC ...
438243 ; 438245 ; 438248 ; 438249 ; 438386 ; 438388 ; 438391 ; 438392 ;
Abstract
Method for forming three-dimensional device structures comprising a second device having sub-groundrule features formed over a first device is disclosed. A layer having a single crystalline top surface is formed above the first device to provide the base for forming the active area of the second device. the sub-groundrule feature is formed using mandrel and spacers.