The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 30, 1999
Filed:
Jun. 26, 1997
Akihiro Nakae, Tokyo, JP;
Mitsubishi Denki Kabushiki Kaisha, Tokyo, JP;
Abstract
An exposure mask has a predetermined principal pattern formed on a principal surface of a mask substrate and including a continuous pattern of lines which are repeatedly arranged at a first interval and an isolated pattern which is arranged adjacent to a line of the continuous pattern at a second interval greater than the first interval; and an auxiliary pattern formed along a direction in which the predetermined principal pattern is arranged, adapted to overcome multiple-beam-flux interference of diffracted light on a pupil's plane by providing the isolated pattern with cyclicity, and having a line width which falls outside a limit of resolution on a plane of projection of exposing light. Also disclosed are a method of fabricating the mask, and a method of manufacturing semiconductor devices using the mask.