The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 30, 1999

Filed:

Jul. 29, 1996
Applicant:
Inventor:

Tseng Te Lun, Long Tan Township, TW;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C / ;
U.S. Cl.
CPC ...
427-8 ; 4272481 ; 4272552 ; 216 59 ; 118692 ; 118715 ; 156345 ;
Abstract

The present invention is concerned with a method and apparatus for preventing particle contamination in a semiconductor process chamber wherein a contaminant purge system is utilized which has a first end connected in fluid communication with a conduit connecting between a pressure sensor and a manifold, and a second end connected in fluid communication with an exhaust system such that a purge gas carries contaminant particles from the conduit to the exhaust system and away from the process chamber.


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