The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 16, 1999
Filed:
Apr. 01, 1997
Applicant:
Inventors:
Junji Tsuchiya, Niigata-ken, JP;
Toshinobu Ishihara, Niigata-ken, JP;
Shigehiro Nagura, Niigata-ken, JP;
Katsuya Takemura, Niigata-ken, JP;
Tsuguo Yamaoka, Funabashi, JP;
Assignee:
Shin-Etsu Chemical Co., Ltd., , JP;
Primary Examiner:
Int. Cl.
CPC ...
G03F / ; G03F / ;
U.S. Cl.
CPC ...
4302881 ; 4302861 ; 4302871 ; 4302701 ; 522 31 ; 522 25 ; 522 91 ; 522142 ; 522148 ;
Abstract
A chemically amplified positive resist composition contains (A) an organic solvent, (B) a base resin in the form of a polysiloxane having phenolic hydroxyl groups some of which are protected with alkoxyalkyl groups and having a weight average molecular weight of 2,000-50,000, (C) a photoacid generator, and (D) a vinyl ether group-containing compound. The composition has high sensitivity to actinic radiation, is developable with aqueous base to form a resist pattern, and lends itself to fine patterning.