The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 09, 1999
Filed:
Dec. 30, 1991
Applicant:
Inventors:
Kuo-Hua Lee, Lower Macungie, PA (US);
Chen-Hua Douglas Yu, Allentown, PA (US);
Assignee:
Lucent Technologies Inc., Murray Hill, NJ (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L / ; H01L / ; H01L / ;
U.S. Cl.
CPC ...
438639 ; 438696 ;
Abstract
A self aligned contact to the substrate in the region between two gate electrodes is formed by depositing a conformal dielectric layer and patterning to form a contact window. The conductive elements of the gate electrode are not contacted because of etch rate differentials between the conformal dielectric and the insulating elements of the gate structure.