The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 02, 1999
Filed:
Mar. 04, 1997
Shuichi Kanno, Hitachi, JP;
Hiroshi Kawagoshi, Hitachi, JP;
Akira Kato, Mito, JP;
Toshiaki Arato, Hitachinaka, JP;
Hisao Yamashita, Hitachi, JP;
Shigeru Azuhata, Hitachi, JP;
Shin Tamata, Ooarai-machi, JP;
Shinzo Ikeda, Toukai-mura, JP;
Takeshi Yasuda, Tokyo, JP;
Hitachi, Ltd., Tokyo, JP;
Abstract
A method for treating a gas flow containing organohalogen compounds including the steps of contacting the gas flow with a catalyst at a temperature below 500.degree. C. in the presence of an effective amount of steam, wherein the catalyst contains titania, tungsten oxide, and silica, the Ti and W are present in the range of 20-95 mol % Ti and 5-80 mol % W based on Ti and W, and the amount of silica is in the range of 0.5-15% by weight silica to 100% by weight titania. Accordingly, the organohalogen compound can be decomposed effectively to carbon monoxide, carbon dioxide, and hydrogen halide.