The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 02, 1999
Filed:
Sep. 18, 1996
Applicant:
Inventors:
Charles R Szmanda, Westborough, MA (US);
Gary N Taylor, Marlborough, MA (US);
Robert L Brainard, Wayland, MA (US);
Manuel DoCanto, Stoughton, MA (US);
Assignee:
Shipley Company, L.L.C., Marlborough, MA (US);
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03C / ; C03F / ;
U.S. Cl.
CPC ...
4302701 ; 4302851 ; 430908 ; 430916 ; 526271 ; 5263171 ; 5263285 ; 5263297 ;
Abstract
A method for making an acrylic resin photoresist characterized by polymerization of an acrylic monomer in a solvent that dissolves all monomers and resultant polymers. The use of the solvent permits formation of acrylic resins suitable for use in the preparation of photoresists without recovery from its reaction mixture. Photoresists prepared from such polymers have improved transparency, especially at exposures of 193 mn or less.