The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 02, 1999
Filed:
Dec. 23, 1996
Applicant:
Inventors:
Jorge Regolini, Bernin, FR;
Daniel Bensahel, Grenoble, FR;
Assignee:
France Telecom, , FR;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C23C / ;
U.S. Cl.
CPC ...
427255 ; 4272552 ; 4272553 ; 4272554 ; 4272557 ; 438677 ; 438683 ;
Abstract
Process for selectively depositing a refractory metal silicide on a surface of a monocrystalline or polycrystalline silicon wafer, comprising: a step of preparing said surface, consisting in forming a silicon oxide or silicon oxynitride layer having a thickness e.ltoreq.1 nm on this surface; and, on the silicon oxide or oxynitride layer formed, a step of selective vapor deposition of a refractory metal silicide.
Regolini, Jorge. (1999). Process for selectively depositing a refractory metal silicide on (U.S. Patent No. 5876796). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5876796
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile