The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 02, 1999
Filed:
Aug. 15, 1996
Jae-woo Nam, Suwon, KR;
Samsung Electronics Co., Ltd., Suwon, KR;
Abstract
A cleaning solution of a semiconductor device is composed of aqueous ammonia (NH.sub.4 OH), methanol (CH.sub.3 OH), hydrofluoric acid (HF) and deionized water (DI--H.sub.2 O), the volume ratio of NH.sub.4 OH to CH.sub.3 OH to DI--H.sub.2 O being 1:1-50:0.1-50, and the volume of HF being 1-10,000 ppm with respect to the mixture solution of NH.sub.4 OH, CH.sub.3 OH and DI--H.sub.2 O. The cleaning solution can be manufactured by simply mixing the respective compositions. The cleaning solution can strip polymers and particles within a short time, without etching or damaging the cleaned metal layers. Since the cleaning process of a semiconductor device is simplified, the processing cost is reduced and the yield and reliability are improved.