The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 09, 1999
Filed:
Nov. 05, 1997
Applicant:
Inventors:
Chen-Cheng Kuo, Hsin-Chu, TW;
Ho-Ku Lan, Hsin-Chu, TW;
Hung-Chih Chen, Shin-Chu, TW;
Shih-Shiung Chen, Shin-Chu, TW;
Assignee:
Taiwan Semiconductor Manufacturing Co. Ltd., Hsin-Chu, TW;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03C / ; B05D / ;
U.S. Cl.
CPC ...
4302701 ; 430311 ; 430935 ; 427 58 ; 438909 ;
Abstract
The present invention discloses a method for coating a polyimide precursor on an electronic structure incorporating the use of a silicon coupling agent without any bubble defect in the film deposited. The method can be carried out by flowing at least one inert gas through a deposition chamber and thereby keeping the relative humidity in the chamber at below 25% to carry away the formation of any water molecules and water vapor to prevent the formation of bubbles in the film deposited.