The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 09, 1999
Filed:
May. 16, 1995
Applicant:
Inventor:
John C Sardella, Highland Village, TX (US);
Assignee:
STMicroelectronics, Inc., Carrollton, TX (US);
Primary Examiner:
Int. Cl.
CPC ...
G03C / ;
U.S. Cl.
CPC ...
430319 ; 430-9 ; 430 11 ; 430 12 ; 430 16 ; 430313 ; 430318 ; 430311 ; 430312 ; 430329 ; 430333 ;
Abstract
A structure formed during processing of an integrated circuit. Two layers of photoresist are formed over a conductive layer to be patterned. The lower layer is thinner than the upper layer, and is dyed to have a lower transmittance. Both layers are used as a masking pattern for the underlying conductive layer.
Sardella, John. (1999). Integrated circuit structure having two photoresist layers (U.S. Patent No. 5869175). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5869175
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile