The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 09, 1999

Filed:

Jun. 21, 1996
Applicant:
Inventors:

Srinivasa S Reddy, Lagrangeville, NY (US);

John U Knickerbocker, Hopewell Junction, NY (US);

Donald R Wall, Poughkeepsie, NY (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C23C / ;
U.S. Cl.
CPC ...
427250 ; 427255 ; 4272551 ; 427 99 ; 427592 ; 427593 ; 428683 ; 428680 ;
Abstract

The present invention discloses a CVD (Chemical Vapor Deposition) process where nickel or alloys thereof, such as, Ni/Cu, Ni/Co, are deposited on metal surfaces which are capable of receiving nickel or alloys thereof, using an Iodide source, preferably an Iodide salt, such as, Copper Iodide.


Find Patent Forward Citations

Reddy, Srinivasa. (1999). Cvd of metals capable of receiving nickel or alloys thereof using iodide (U.S. Patent No. 5869134). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5869134

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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